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MPCVD Reactor System
MP915C - 25 kW Microwave Plasma Chemical Vapor Deposition (MPCVD) System
Model · MP915C
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The MP915C is a high-performance MPCVD system designed for large-area diamond deposition in semiconductor and jewellery industries. With a continuous microwave power output of 25 kW, it delivers high-purity diamond with exceptional growth rates and precise doping control. The system features a motorized translation stage with in-situ z-axis adjustment during diamond growth, ensuring excellent process stability and repeatability.
Key Advantages
- Large deposition area for semiconductor industry or jewellery industry
- High-purity diamond
- High growth rate
- Non-contamination
- Precise doping control
- Excellent process stability & repeatability
- High reliability
- Wide-range process control
Technical Specifications
- Microwave Power
- 25 kW
- Translation Stage
- Motorized z-axis adjustable in situ during diamond growth
- Control Interface
- Graphical User Interface (GUI) with multiple screens for active user control
- Remote Access
- Internet control and monitoring available
- Safety Systems
- Multiple process and safety alarm levels for unattended operation
- Process Control
- Programmable operation supported by step recipe
- MFC Manifolds
- Up to six digitally controlled MFC manifolds
- Pressure Control
- Automatic pressure control
- Backup Power
- PC and electronics backed by UPS
- Optical Ports
- >7 x Optical ports
- Pyrometry
- 2-color IR pyrometer
- Power
- 25 kW
- Growth Area
- Large area
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