MP915C

25-100 kW Microwave Plasma Chemical Vapor Deposition (MPCVD) System

Advantages

• Large deposition area for semiconductor industry or jewellery industry
• High-purity diamond
• High growth rate
• Non-contamination
• Precise doping control
• Excellent process stability & repeatability
• High reliability
• Wide-range process control

Specifications

• Microwave power 25-100kW
• Motorized translation stage z-axis adjustable in situ during diamond growth
• Graphical User interface (GUI) provides multiple screens for active user control of process parameters and for process monitoring. Internet control and monitoring is available
• Levels of process and safety alarms allow unattended and safe operation of the system
• Remote process monitoring option
• Programmable operation supported by step recipe
• Up to six digitally controlled MFC manifolds.
• Automatic pressure control
• PC and electronic is backup by UPS
• > 7 x Optical ports
• 2-color IR pyrometer