25-100 kW Microwave Plasma Chemical Vapor Deposition (MPCVD) System
Advantages
Large deposition area for semiconductor industry or jewellery industry
High-purity diamond
High growth rate
Non-contamination
Precise doping control
Excellent process stability & repeatability
High reliability
Wide-range process control
Specifications
Microwave power 25-100kW
Motorized translation stage z-axis adjustable in situ during diamond growth
Graphical User interface (GUI) provides multiple screens for active user control of process parameters and for process monitoring. Internet control and monitoring is available
Levels of process and safety alarms allow unattended and safe operation of the system
